Low PH Centella Cleansing Powder

CosRX

Low PH Centella Cleansing Powder

Average rating from 1 Ratings
3.0

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Low PH Centella Cleansing Powder

3.0
from 1 Ratings
Product Overview

Quick Product Notes
(Click on Icons for more information)

Paraben-Free
Sulfate-Free
Alcohol-Free
Silicone-Free
EU Allergen-Free
Fungal Acne (Malassezia) Safe
Minimal Ingredients

PH Level

(Know the PH? Submit it here! )

N/A - No submissions yet

Notable Effects & Ingredients


Promotes Wound Healing from 1 Ingredient(s):
Centella Asiatica Extract

Ingredients Related to Skin Types
Click on the arrow next to the Skin Type! Green = Good & Red = Bad

Dry Skin
None
Oily/Acne-Prone Skin
1
1
Sensitive Skin
1

Ingredient Safety Breakdown (EWG Health Ratings)

  • Low Risk
  • Moderate Risk
  • High Risk
  • Unknown
100%
0%
0%
0%

My Ingredient Notes

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Product Ingredient List

(Showing first 5 of 9 Ingredients)
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Lipase
(Skin Conditioning,Lytic Agent)
1
A
Maltodextrin
(Skin Conditioning,Emulsion Stabilising,Hair Conditioning,Binding Agent,Binding,Film Forming,Absorbent,Suspending Agent - Nonsurfactant)
1
B
Centella Asiatica Extract
(Skin Conditioning,Cleansing,Soothing,Tonic,Smoothing)
Promotes Wound Healing
Promotes Wound Healing
1
B
Sodium Lauroyl Glutamate
(Surfactant,Antistatic Agent,Hair Conditioning)
1
B
Sodium Lauroyl Aspartate
(Surfactant,Hair Conditioning,Cleansing)

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